Sistem de Tratament al Suprafaței cu Plasma | Nano - Sistem de Plasma la Presiune Mică, Sistem de Tratament al Suprafaței cu Plasma, Curățător Plasma
Plasma systems from Diener electronic have long since established themselves in a wide range of industrial sectors. With the Nano low-pressure plasma system, you can rely on modern and future-proof cold plasma technology in a vacuum. The chamber volume of 18 up to 24 litres of this plasma system offers enough space to serve laboratory and also series production.
Plasma treatment in low-pressure plasma is a proven technique for controlled ultra-fine cleaning, improvement of adhesion (activation and etching) and coating of thin layers on substrate surfaces. Plasma is generated by applying high-frequency voltage in the vacuum chamber. In the process, the process gas introduced there is ionised.
Fields of application:
VOC-free cleaning of organic residues.
Activation before painting, gluing, potting, ...
Etching of PTFE, photoresist, oxide layers, ...
Super-hydrophobic and -hydrophilic coatings
Dimensions (Table Top):560 mm x 600 - 860 mm x 600 mm (WxHxD)
Dimensions (Stand Alone):600 mm x 1700 mm x 800 mm (WxHxD)
Vacuum Chamber material:Stainless steel, Aluminium, Silica glass (UHP), Borosilicate (HP)
Vacuum Chamber dimensions:ca. W 240 mm x H 240 mm x D 400 - 420 mm; Ø 267 mm, D 400 - 420 mm
Vacuum Chamber volume:approx. 18 - 24 litres
Vacuum Chamber closure:Lid, hinged door
Gas supply:Needle valves or mass flow controllers (MFCs)
Pressure measurement:Pirani, Capacity pressure gauge
Generator:100 kHz; 80 kHz; 13,56 MHz; 2,45 GHz
Electrodes:According to customer requirements
Controles:Semiautomatic, Rotary switch, Basic PC (Win.CE), Full PC (Win.10 IoT)
Power supply:230 V / 400 V / 50 - 60 Hz
Vacuum pump:Capacity: 16 m³/h